Made-to-Order Sputtering
FURUYA METAL provides made-to-order sputtering service for Magnetic Recording, Touch Panels, Non-volatile semiconductor memory, electric devices and electric components. We are able to provide various kinds of PGM targets. FURUYA commits to contributing to your efficient R&D by speeding up and reducing the costs of development.
Machines
Planar Sputtering
RF Plasma Support Sputtering Machine
We can do film formation using 2- and 3-dimensional co-sputtering. Also, since our cathodes are small at φ2 inches, we can perform materials searches at low initial cost because this size is optimal for materials exploration.
Long TS Multiple Cathode Sputtering Machine
Since we can form films on everything from minute substrates to φ8 inch wafers, we can get new materials onto device development lines and evaluate these materials in-house.
High Vacuumφ8inch Sputtering Machine
We can form films under high vacuum conditions because we use load lock-type apparatus.
We can supply uniform films through the use of φ300mm targets.
Interback Sputtering Machine
We can form films on large substrates such as φ300Si wafers and glass for FPD.
Powder Sputtering
Powder Sputtering is a technology which coats metals, ceramics, and various other materials at a nano level using a fine powder in a dry environment.
Other Services
Patterning
We provide patterning processing using metal masks and resist patterns together with film formation processing.
Thin Film Analysis
According to our customer needs, FURUYA METAL also conduct thin film analysis.
CONTACT
Frequently asked questions.
- What is the maximum wafer size for film deposition?
- What is the annealing temperature?
- I'd like to reuse an used beet dish...
- I would like to know the price of Ru nitrate and the recent metal price.
Opening from 9:00 to 17:00 on weekdays